Morphology evolution of fused silica surface during ion beam figuring of high-slope optical components

W Liao, Y Dai, X Xie, L Zhou - Applied Optics, 2013 - opg.optica.org
Ultra-precision and ultra-smooth surfaces are vitally important for some high performance
optical systems. Ion beam figuring (IBF) is a well-established, highly deterministic method for …

Researches on formation mechanism of ultra-smooth surface during ion beam sputtering of fused silica

W Liao, X Nie, Z Liu, X Nie, W Wan - Optik, 2019 - Elsevier
Ion beam figuring (IBF) is well identified as a highly deterministic method for the final figuring
of nanometer-precision optical surfaces, where the figuring process involves an …

Nanopatterning of optical surfaces during low-energy ion beam sputtering

W Liao, Y Dai, X Xie - Optical Engineering, 2014 - spiedigitallibrary.org
Ion beam figuring (IBF) provides a highly deterministic method for high-precision optical
surface fabrication, whereas ion-induced microscopic morphology evolution would occur on …

Pattern formation on Si surfaces by low-energy ion beam erosion

MI Cornejo - 2011 - publikationen.sulb.uni-saarland.de
Self-organization by low-energy ion beam erosion provides an alternative route for the
fabrication of nanostructures on different materials in only one step. This study focuses on …

[HTML][HTML] The role of phase separation for self-organized surface pattern formation by ion beam erosion and metal atom co-deposition

H Hofsäss, K Zhang, A Pape, O Bobes, M Broetzmann - Applied Physics A, 2013 - Springer
We investigate the ripple pattern formation on Si surfaces at room temperature during
normal incidence ion beam erosion under simultaneous deposition of different metallic co …

Real-time x-ray studies of Mo-seeded Si nanodot formation during ion bombardment

G Ozaydin, AS Özcan, Y Wang, KF Ludwig… - Applied Physics …, 2005 - pubs.aip.org
The formation of self-organized Si nanostructures induced by Mo seeding during normal
incidence Ar+ ion bombardment at room temperature is reported. Silicon surfaces without …

Silicide induced ion beam patterning of Si (001)

M Engler, F Frost, S Müller, S Macko, M Will… - …, 2014 - iopscience.iop.org
Low energy ion beam pattern formation on Si with simultaneous co-deposition of Ag, Pd, Pb,
Ir, Fe or C impurities was investigated by in situ scanning tunneling microscopy as well as ex …

Role of ion beam induced solid flow in surface patterning of Si (1 0 0) using Ar ion beam irradiation

T Kumar, A Kumar, NP Lalla, S Hooda, S Ojha… - Applied surface …, 2013 - Elsevier
Variation in the thicknesses of amorphous layer during ripple evolution on Si surface by 50
keV Ar+ ion bombardment has been studied as a function of ion fluence. Atomic force …

Damage profiles of Si (001) surface via Ar cluster beam sputtering

YK Kyoung, HI Lee, JG Chung, S Heo… - Surface and …, 2013 - Wiley Online Library
Damage profiles on Si (001) surface via argon gas cluster ion beam sputtering and mono‐
atomic argon ion beam sputtering were investigated using medium energy ion scattering …

[HTML][HTML] Evolution of nanoripples on silicon by gas cluster-ion irradiation

O Lozano, QY Chen, BP Tilakaratne, HW Seo… - AIP Advances, 2013 - pubs.aip.org
Si wafers of (100),(110) and (111) orientations were bombarded by gas cluster ion beam
(GCIB) of 3000 Ar-atoms/cluster on average at a series of angles. Similar surface …