Growth and characterization of AlGaInAs lattice matched to InP grown by molecular‐beam epitaxy

JP Praseuth, MC Joncour, JM Gerard… - Journal of applied …, 1988 - pubs.aip.org
We present a complete investigation of crystalline, optical, and electrical properties of
molecular‐beam‐epitaxial‐grown AlGaInAs lattice matched to InP covering the whole range …

Chemical beam epitaxial growth of extremely high quality InGaAs on InP

WT Tsang, AH Dayem, TH Chiu… - Applied physics …, 1986 - pubs.aip.org
Full widths at half-maximum intensity of the (004) Bragg reflecton peak as small as 24 arcs
are obtained from InGaAs epilayers 4-6/-lm thick. Such linewidth is the narrowest reported …

Liquid phase epitaxy of unstable alloys: Substrate‐induced stabilization and connected effects

M Quillec, H Launois, MC Joncour - Journal of Vacuum Science & …, 1983 - pubs.aip.org
It is now well admitted that most quaternary III–V compounds show unstable regions in the
temperature range commonly used in epitaxy. For instance, according to these authors, the …

Temperature dependence of photoluminescence of n‐InGaAsP

H Temkin, VG Keramidas, MA Pollack… - Journal of applied …, 1981 - pubs.aip.org
The temperature dependence (from 6 to 300 K) of the near band gap photoluminescence
(PL) of n‐type InGaAsP is investigated. These layers, epitaxially grown on InP substrates …

Liquid phase epitaxial growth of AlGaInPAs lattice matched to GaAs

S Mukai, H Yajima, Y Mitsuhashi, S Yanagisawa… - Applied physics …, 1984 - pubs.aip.org
Liquid phase epitaxial growth of (Al x Ga1− x) 1− z In z P y As1− y lattice matched to GaAs is
investigated. Uniform layers with high emission efficiency are obtained for x∼ 0.3 and y< …

Auger profile study of the influence of lattice mismatch on the LPE InGaAsP‐InP heterojunction interface

M Feng, LW Cook, MM Tashima, GE Stillman… - Applied Physics …, 1979 - pubs.aip.org
Auger depth profiles of InGaAsP‐InP heterojunctions grown by liquid phase epitaxial
techniques under different lattice‐mismatch conditions have been measured. Results are …

X‐Ray, Photoluminescence, and SIMS Characterization of InGaAs/InP Grown by Vapor Phase Epitaxy

AT Macrander, V Swaminathan - Journal of the Electrochemical …, 1987 - iopscience.iop.org
ABSTRACT X-ray double crystal diffractometry (DCD), low temperature photoluminescence
(PL), and secondary ion mass spectrometry (SIMS) have been used to characterize single …

InGaAsP/InGaP superlattices by conventional MBE with molten metal solution phosphorus source

MA Putyato, VV Preobrazhenskii, BR Semyagin… - Journal of crystal …, 2003 - Elsevier
A phosphorus beam source utilizing thermal decomposition of InP is employed in a
molecular beam epitaxy system. Quaternary InGaAsP films with reproducible P and As …

Liquid phase epitaxial growth of InGaAs on InP

R Sankaran, RL Moon, GA Antypas - Journal of Crystal Growth, 1976 - Elsevier
The conditions for LPE-growth of In 0.53 Ga 0.47 As lattice matched to InP and growth of InP
on In 0.53 Ga 0.47 As are discussed. The distribution coefficient of Ga in the In-Ga-As melt is …

Properties of Liquid Phase Epitaxial In1− x Ga x As (x≅ 0.5) on InP Substrate

Y Takeda, A Sasaki, Y Imamura… - Journal of The …, 1978 - iopscience.iop.org
ABSTRACT Undoped Inl-zGaxAs (x~ 0.5) crystal films with very homogeneous composition
were grown on InP substrates by liquid phase epitaxy. Study was made on physical …