G Cunge, M Kogelschatz, N Sadeghi - Plasma Sources Science and …, 2004 - inis.iaea.org
[en] The absolute concentrations of SiCl X (X= 0-2), SiF X (X= 1-2), SiClF, SiBr and SiO
radicals were measured in an industrial silicon gate etching reactor with various halogen …