Feedback control of plasma etching reactors for improved etching uniformity

A Armaou, J Baker, PD Christofides - Chemical engineering science, 2001 - Elsevier
This work focuses on the design and implementation of a feedback control system on a
parallel electrode plasma etching (PE) process with showerhead arrangement used to etch …

Feedback control of plasma etching reactors for improved etching uniformity

A Armaou, J Baker, PD Christofides - Chemical Engineering Science, 2001 - elibrary.ru
This work focuses on the design and implementation of a feedback control system on a
parallel electrode plasma etching (PE) process with showerhead arrangement used to etch …

Feedback control of plasma etching reactors for improved etching uniformity

A Armaou, J Baker, PD Christofides - Chemical Engineering Science, 2001 - infona.pl
This work focuses on the design and implementation of a feedback control system on a
parallel electrode plasma etching (PE) process with showerhead arrangement used to etch …

Feedback control of plasma etching reactors for improved etching uniformity

A Armaou, J Baker, PD Christofides - Chemical Engineering Science, 2001 - pure.psu.edu
This work focuses on the design and implementation of a feedback control system on a
parallel electrode plasma etching (PE) process with showerhead arrangement used to etch …

Feedback control of plasma etching reactors for improved etching uniformity

A Armaou, J Baker, PD Christofides - Chemical Engineering Science, 2001 - hero.epa.gov
This work focuses on the design and implementation of a feedback control system on a
parallel electrode plasma etching (PE) process with showerhead arrangement used to etch …

Feedback control of plasma etching reactors for improved etching uniformity

A Armaou, J Baker… - Chemical Engineering …, 2001 - ui.adsabs.harvard.edu
This work focuses on the design and implementation of a feedback control system on a
parallel electrode plasma etching (PE) process with showerhead arrangement used to etch …

[引用][C] Feedback control of plasma etching reactors for improved etching uniformity

A ARMAOU, J BAKER… - Chemical engineering …, 2001 - pascal-francis.inist.fr
Feedback control of plasma etching reactors for improved etching uniformity CNRS Inist
Pascal-Francis CNRS Pascal and Francis Bibliographic Databases Simple search Advanced …

[引用][C] Feedback control of plasma etching reactors for improved etching uniformity

A ARMAOU, J BAKER, PD CHRISTOFIDES - Chemical engineering …, 2001 - Elsevier