RMR Pinto, V Gund, C Calaza… - Microelectronic …, 2022 - researchgate.net
Aluminum nitride (AlN) is a technologically relevant material that can be deposited at low temperatures in the form of thin-films while preserving most of its physical properties …
RMR Pinto, V Gund, C Calaza… - Microelectronic …, 2022 - impressions.manipal.edu
Aluminum nitride (AlN) is a technologically relevant material that can be deposited at low temperatures in the form of thin-films while preserving most of its physical properties …
RMR Pinto, V Gund, C Calaza, KK Nagaraja… - 2022 - dl.acm.org
Aluminum nitride (AlN) is a technologically relevant material that can be deposited at low temperatures in the form of thin-films while preserving most of its physical properties …