A combined plasma‐surface model for the deposition of C: H films from a methane plasma
A Von Keudell, W Möller - Journal of applied physics, 1994 - pubs.aip.org
The deposition of C: H layers by an electron‐cyclotron‐resonance plasma from methane
was investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …
was investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …
[引用][C] A combined plasma‐surface model for the deposition of C: H films from a methane plasma
A von Keudell, W Möller - Journal of Applied Physics, 1994 - cir.nii.ac.jp
A combined plasma‐surface model for the deposition of C:H films from a methane plasma |
CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細へ移動 検索フォームへ …
CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細へ移動 検索フォームへ …
[PDF][PDF] A combined plasma-surface model for the deposition of C: H films from a methane plasma
A von Keudell, W MGller - reactions - scholar.archive.org
The deposition of C: H layers by an electron-cyclotron-resonance plasma from methane was
investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …
investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …
A combined plasma-surface model for the deposition of C: H films from a methane plasma
A von Keudell, W MGller - reactions - pubs.aip.org
The deposition of C: H layers by an electron-cyclotron-resonance plasma from methane was
investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …
investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …
A combined plasma-surface model for the deposition of C: H films from a methane plasma
A von Keudell, W Möller - Journal of Applied Physics, 1994 - ui.adsabs.harvard.edu
The deposition of C: H layers by an electron-cyclotron-resonance plasma from methane was
investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …
investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …
[引用][C] A combined plasma‐surface model for the deposition of C: H films from a methane plasma
A Keudell, W Möller - Journal of Applied Physics, 1994 - pure.mpg.de
A combined plasma‐surface model for the deposition of C:H films from a methane plasma ::
MPG.PuRe 日本語 Help Privacy Policy ポリシー/免責事項 全文を含む 詳細検索ブラウズ ホーム …
MPG.PuRe 日本語 Help Privacy Policy ポリシー/免責事項 全文を含む 詳細検索ブラウズ ホーム …
[PDF][PDF] A combined plasma-surface model for the deposition of C: H films from a methane plasma
A von Keudell, W MGller - reactions - scholar.archive.org
The deposition of C: H layers by an electron-cyclotron-resonance plasma from methane was
investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …
investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate …