High-definition nanoimprint stamp fabrication by atomic layer etching

SA Khan, DB Suyatin, J Sundqvist… - ACS Applied Nano …, 2018 - ACS Publications
Nanoimprint lithography (NIL) has the potential for low-cost and high-throughput nanoscale
fabrication. However, the NIL quality and resolution are usually limited by the shape and …
被引用次数：10 相关文章

High-definition nanoimprint stamp fabrication by atomic layer etching

SA Khan, DB Suyatin, J Sundqvist, M Graczyk… - 2018 - publica.fraunhofer.de
Nanoimprint lithography (NIL) has the potential for low-cost and high-throughput nanoscale
fabrication. However, the NIL quality and resolution are usually limited by the shape and …

[引用][C] High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching

SA Khan, D Suyatin, J Sundqvist… - ACS Applied Nano …, 2018 - portal.research.lu.se
process, such as trenching and sidewall tapering. The ALE-processed silicon wafers were
used as hard nanoimprint stamps in a thermal nanoimprint process. Features as small as 30 …

High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching

SA Khan, DB Suyatin, J Sundqvist… - ACS Applied Nano …, 2018 - research.aalto.fi
Nanoimprint lithography (NIL) has the potential for low-cost and high-throughput nanoscale
fabrication. However, the NIL quality and resolution are usually limited by the shape and …

[引用][C] High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching

SA Khan, D Suyatin, J Sundqvist, M Graczyk… - ACS Applied Nano …, 2018 - lup.lub.lu.se
Nanoimprint lithography (NIL) has the potential for low-cost and high-throughput nanoscale
fabrication. However, the NIL quality and resolution are usually limited by the shape and …