MoS2 Functionalization with a Sub-nm Thin SiO2 Layer for Atomic Layer Deposition of High-κ Dielectrics

H Zhang, G Arutchelvan, J Meersschaut… - Chemistry of …, 2017 - ACS Publications
Several applications of two-dimensional (2D) semiconducting transition metal
dichalcogenides (TMDs) in nanoelectronic devices require the deposition of ultrathin …
被引用次数：42 相关文章

[引用][C] MoS2 functionalization with a Sub-nm thin SiO2 layer for atomic layer deposition of high-k dielectrics

H Zhang, G Arutchelvan, J Meersschaut, A Gaur… - 2017 - imec-publications.be
MoS2 functionalization with a Sub-nm thin SiO2 layer for atomic layer deposition of high-k
dielectrics Toggle navigation My submissions Login Toggle navigation View item imec …