Study of alternate hardmasks for extreme ultraviolet patterning
A De Silva, I Seshadri, A Arceo, K Petrillo… - Journal of Vacuum …, 2016 - pubs.aip.org
Traditional patterning stacks for deep ultraviolet patterning have been based on a trilayer
scheme with an organic planarizing layer, silicon antireflective coating or organic bottom …
scheme with an organic planarizing layer, silicon antireflective coating or organic bottom …
Study of alternate hardmasks for extreme ultraviolet patterning
A De Silva, I Seshadri, A Arceo, K Petrillo… - Journal of Vacuum …, 2016 - pubs.aip.org
Traditional patterning stacks for deep ultraviolet patterning have been based on a trilayer
scheme with an organic planarizing layer, silicon antireflective coating or organic bottom …
scheme with an organic planarizing layer, silicon antireflective coating or organic bottom …
Study of alternate hardmasks for extreme ultraviolet patterning
A De Silva, I Seshadri, A Arceo… - Journal of Vacuum …, 2016 - ui.adsabs.harvard.edu
Traditional patterning stacks for deep ultraviolet patterning have been based on a trilayer
scheme with an organic planarizing layer, silicon antireflective coating or organic bottom …
scheme with an organic planarizing layer, silicon antireflective coating or organic bottom …
Study of alternate hardmasks for extreme ultraviolet patterning
A De Silva, I Seshadri, A Arceo, K Petrillo, L Meli… - JVSTB, 2016 - research.ibm.com
Traditional patterning stacks for deep ultraviolet patterning have been based on a trilayer
scheme with an organic planarizing layer, silicon antireflective coating or organic bottom …
scheme with an organic planarizing layer, silicon antireflective coating or organic bottom …