New paradigm in lens metrology for lithographic scanner: evaluation and exploration

K Lai, GM Gallatin, MA van de Kerkhof… - Optical …, 2004 - spiedigitallibrary.org
A new paradigm of lens metrology, which is an on-board in-situ interferometer on a scanner,
is evaluated. We called this system as Inline PMI and is based on a shearing type …

[PDF][PDF] New paradigm in Lens metrology for lithographic scanner: evaluation and exploration

K Lai, G Gallatin, M van de Kerkhof, W de Boeij, H Kok… - academia.edu
ABSTRACT A new paradigm of lens metrology, which is an on-board in-situ interferometer
on a scanner, is evaluated. We called this system as Inline PMI and is based on a shearing …

New paradigm in lens metrology for lithographic scanner: evaluation and exploration

K Lai, GM Gallatin, MA van de Kerkhof… - Optical …, 2004 - ui.adsabs.harvard.edu
A new paradigm of lens metrology, which is an on-board in-situ interferometer on a scanner,
is evaluated. We called this system as Inline PMI and is based on a shearing type …

New paradigm in lens metrology for lithographic scanner: evaluation and exploration

K Lai, G Gallatin, M van de Kerkhof - spiedigitallibrary.org
ABSTRACT A new paradigm of lens metrology, which is an on-board in-situ interferometer
on a scanner, is evaluated. We called this system as Inline PMI and is based on a shearing …

[PDF][PDF] New paradigm in Lens metrology for lithographic scanner: evaluation and exploration

K Lai, G Gallatin, M van de Kerkhof, W de Boeij, H Kok… - researchgate.net
ABSTRACT A new paradigm of lens metrology, which is an on-board in-situ interferometer
on a scanner, is evaluated. We called this system as Inline PMI and is based on a shearing …