Real-time monitoring and control of plasma etching

M Sarfaty, C Baum, M Harper… - Japanese journal of …, 1998 - iopscience.iop.org
Real-time etch rate of thin transparent films is determined within seconds by an in-situ two-
color laser interferometer. The use of two colors improves the accuracy of the calculated …
被引用次数：17 相关文章

Real-Time Monitoring and Control of Plasma Etching

M Sarfaty, C Baum, M Harper… - … Journal of Applied …, 1998 - ui.adsabs.harvard.edu
Real-time etch rate of thin transparent films is determined within seconds by an in-situ two-
color laser interferometer. The use of two colors improves the accuracy of the calculated …

[引用][C] Real-Time Monitoring and Control of Plasma Etching.

M Sarfaty, C Baum, M Harper, N Hershkowitz… - Japanese Journal of …, 1998 - jlc.jst.go.jp
Real-time etch rate of thin transparent films is determined within seconds by an in-situ two-
color laser interferometer. The use of two colors improves the accuracy of the calculated …

Real-Time Monitoring and Control of P1asma Etching

S Moshe, B Chris, H Michael, H Noah - Japanese Journal of Applied …, 1998 - cir.nii.ac.jp
抄録 Real-time etch rate of thin transparent films is determined within seconds by an in-situ
two-color laser interferometer. The use of two colors improves the accuracy of the calculated …

[引用][C] Real-Time Monitoring and Control of Plasma Etching.

M Sarfaty, C Baum, M Harper, N Hershkowitz… - Japanese Journal of …, 1998 - jlc.jst.go.jp
Real-time etch rate of thin transparent films is determined within seconds by an in-situ two-
color laser interferometer. The use of two colors improves the accuracy of the calculated …

[引用][C] REAL-TIME MONITORING AND CONTROL OF PLASMA ETCHING

M SARFATY, C BAUM… - Japanese …, 1998 - Japanese journal of applied physics