Neural Network based control strategies for improving plasma characteristics in reactive ion etching
Neurocomputing, 2006 - Elsevier
Reactive ion etching (RIE) is a key process in VLSI circuit fabrication. It is known that this
process is not very robust and requires frequent tuning to achieve acceptable yields. The …
process is not very robust and requires frequent tuning to achieve acceptable yields. The …
Neural Network-Based Control Strategies for Improving Plasma Characteristics in Reactive Ion Etching
N Tudoroiu, RV Patel, K Khorasani - Science Direct Working Paper …, 2002 - papers.ssrn.com
Abstract Reactive Ion Etching (RIE) is a key process in VLSI circuit fabrication. At present,
most semiconductor manufacturing equipment is designed to be operated in an open-loop …
most semiconductor manufacturing equipment is designed to be operated in an open-loop …
Neural network based control strategies for improving plasma characteristics in reactive ion etching
N Tudoroiu, RV Patel, K Khorasani - Neurocomputing, 2006 - dl.acm.org
Reactive ion etching (RIE) is a key process in VLSI circuit fabrication. It is known that this
process is not very robust and requires frequent tuning to achieve acceptable yields. The …
process is not very robust and requires frequent tuning to achieve acceptable yields. The …
Neural network based control strategies for improving plasma characteristics in reactive ion etching
N Tudoroiu, RV Patel, K Khorasani - Neurocomputing, 2006 - infona.pl
Reactive ion etching (RIE) is a key process in VLSI circuit fabrication. It is known that this
process is not very robust and requires frequent tuning to achieve acceptable yields. The …
process is not very robust and requires frequent tuning to achieve acceptable yields. The …