Nonselective and smooth etching of GaN/AlGaN heterostructures by inductively coupled plasmas

Y Han, S Xue, T Wu, Z Wu, W Guo, Y Luo… - Journal of Vacuum …, 2004 - pubs.aip.org
A systematic study of the nonselective and smooth etching of GaN/AlGaN heterostructures
was performed using Cl 2/Ar/BCl 3 inductively coupled plasmas (ICPs). Nonselective …

Nonselective and smooth etching of GaN/AlGaN heterostructures by Cl2/Ar/BCl3 inductively coupled plasmas

Y Han, S Xue, T Wu, Z Wu, W Guo, Y Luo… - Journal of Vacuum …, 2004 - cir.nii.ac.jp
抄録< jats: p> A systematic study of the nonselective and smooth etching of GaN/AlGaN
heterostructures was performed using Cl2/Ar/BCl3 inductively coupled plasmas (ICPs) …

Nonselective and smooth etching of GaN/AlGaN heterostructures by Cl2/Ar/BCl3 inductively coupled plasmas

Y Han, S Xue, T Wu, Z Wu, W Guo, Y Luo… - Journal of Vacuum …, 2004 - inis.iaea.org
[en] A systematic study of the nonselective and smooth etching of GaN/AlGaN
heterostructures was performed using Cl 2/Ar/BCl 3 inductively coupled plasmas (ICPs) …

[引用][C] Nonselective and smooth etching of GaN/AlGaN heterostructures by Cl2/Ar/BCl3 inductively coupled plasmas

Y Han, S Xue, T Wu, Z Wu, W Guo… - Journal of Vacuum …, 2004 - ui.adsabs.harvard.edu
Nonselective and smooth etching of GaN/AlGaN heterostructures by Cl<SUB>2</SUB>/Ar/BCl<SUB>3</SUB>
inductively coupled plasmas - NASA/ADS Now on home page ads icon ads Enable full ADS …

Nonselective and smooth etching of GaN/AlGaN heterostructures by Cl2/Ar/BCl3 inductively coupled plasmas

Y Han, S Xue, T Wu, Z Wu, W Guo, Y Luo… - Journal of Vacuum …, 2004 - pubs.aip.org
A systematic study of the nonselective and smooth etching of GaN/AlGaN heterostructures
was performed using Cl 2/Ar/BCl 3 inductively coupled plasmas (ICPs). Nonselective …

[引用][C] Nonselective and smooth etching of GaN/AlGaN heterostuructures by Cl_2/Ar/BCl_3 inductively coupled plasmas

Y HAN - J. Vac. Sci. Technol., A, 2004 - cir.nii.ac.jp
Nonselective and smooth etching of GaN/AlGaN heterostuructures by Cl_2/Ar/BCl_3 inductively
coupled plasmas | CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細へ …