Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing
Our goal is to develop a facile process to create patterns of inorganic oxides and metals on a
substrate that can act as hard masks. These materials should have high etch contrast …
substrate that can act as hard masks. These materials should have high etch contrast …
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing.
T Ghoshal, M Shaw, J Holmes, M Morris - Nano Research, 2016 - search.ebscohost.com
Our goal is to develop a facile process to create patterns of inorganic oxides and metals on a
substrate that can act as hard masks. These materials should have high etch contrast …
substrate that can act as hard masks. These materials should have high etch contrast …
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing
T Ghoshal, MT Shaw, JD Holmes, MA Morris - Nano Research, 2016 - sciopen.com
Our goal is to develop a facile process to create patterns of inorganic oxides and metals on a
substrate that can act as hard masks. These materials should have high etch contrast …
substrate that can act as hard masks. These materials should have high etch contrast …
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing
T Ghoshal, MT Shaw, JD Holmes, MA Morris - Nano Research, 2016 - hero.epa.gov
Our goal is to develop a facile process to create patterns of inorganic oxides and metals on a
substrate that can act as hard masks. These materials should have high etch contrast …
substrate that can act as hard masks. These materials should have high etch contrast …
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing
T Ghoshal, MT Shaw, JD Holmes, MA Morris - Nano Research, 2016 - infona.pl
Our goal is to develop a facile process to create patterns of inorganic oxides and metals on a
substrate that can act as hard masks. These materials should have high etch contrast …
substrate that can act as hard masks. These materials should have high etch contrast …
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing
T Ghoshal, MT Shaw, JD Holmes, MA Morris - 2016 - cora.ucc.ie
Our goal is to develop a facile process to create patterns of inorganic oxides and metals on a
substrate that can act as hard masks. These materials should have high etch contrast …
substrate that can act as hard masks. These materials should have high etch contrast …
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing
T Ghoshal, MT Shaw, JD Holmes, MA Morris - Nano Research, 2016 - search.proquest.com
Our goal is to develop a facile process to create patterns of inorganic oxides and metals on a
substrate that can act as hard masks. These materials should have high etch contrast …
substrate that can act as hard masks. These materials should have high etch contrast …
[PDF][PDF] Development of a Facile Block Copolymer Method for Creating Hard Mask Patterns Integrated into Semiconductor Manufacturing
T Ghoshal, MT Shaw, JD Holmes, MA Morris… - 2016 - cora.ucc.ie
The aim here is the development of a facile process to create patterns of inorganic oxides
and metals on a substrate that can act as hard masks within a lithographic process. These …
and metals on a substrate that can act as hard masks within a lithographic process. These …