[HTML][HTML] Isotropic plasma-thermal atomic layer etching of aluminum nitride using SF6 plasma and Al (CH3) 3
H Wang, A Hossain, D Catherall… - Journal of Vacuum …, 2023 - pubs.aip.org
We report the isotropic plasma atomic layer etching (ALE) of aluminum nitride using
sequential exposures of SF 6 plasma and trimethylaluminum [Al (CH 3) 3]. ALE was …
sequential exposures of SF 6 plasma and trimethylaluminum [Al (CH 3) 3]. ALE was …
Isotropic plasma-thermal atomic layer etching of aluminum nitride using SF6 plasma and Al (CH3) 3
H Wang, A Hossain, D Catherall… - Journal of Vacuum …, 2023 - pubs.aip.org
We report the isotropic plasma atomic layer etching (ALE) of aluminum nitride using
sequential exposures of SF6 plasma and trimethylaluminum [Al (CH3) 3]. ALE was observed …
sequential exposures of SF6 plasma and trimethylaluminum [Al (CH3) 3]. ALE was observed …
Isotropic plasma-thermal atomic layer etching of aluminum nitride using SF6 plasma and Al (CH3) 3
H Wang, A Hossain, D Catherall… - Journal of Vacuum Science …, 2023 - par.nsf.gov
We report the isotropic plasma atomic layer etching (ALE) of aluminum nitride using
sequential exposures of SF6 plasma and trimethylaluminum [Al (CH3) 3]. ALE was observed …
sequential exposures of SF6 plasma and trimethylaluminum [Al (CH3) 3]. ALE was observed …
Isotropic plasma-thermal atomic layer etching of aluminum nitride using SF6 plasma and Al (CH3) 3
H Wang, A Hossain, D Catherall… - Journal of Vacuum …, 2023 - ui.adsabs.harvard.edu
We report the isotropic plasma atomic layer etching (ALE) of aluminum nitride using
sequential exposures of SF6 plasma and trimethylaluminum [Al (CH3) 3]. ALE was observed …
sequential exposures of SF6 plasma and trimethylaluminum [Al (CH3) 3]. ALE was observed …
Isotropic plasma-thermal atomic layer etching of aluminum nitride using SF plasma and Al(CH)
H Wang, A Hossain, D Catherall, AJ Minnich - arXiv preprint arXiv …, 2022 - arxiv.org
We report the isotropic plasma atomic layer etching (ALE) of aluminum nitride using
sequential exposures of SF $ _6 $ plasma and trimethylaluminum (Al (CH $ _3 $) $ _3 …
sequential exposures of SF $ _6 $ plasma and trimethylaluminum (Al (CH $ _3 $) $ _3 …