[HTML][HTML] High-fidelity patterning of AlN and ScAlN thin films with wet chemical etching
We report on the anisotropic wet etching of sputtered AlN and Sc 0.2 Al 0.8 N thin films. With
tetramethyl ammonium hydroxide at 80° C, the etch rates along the c-axis were 330 and 30 …
tetramethyl ammonium hydroxide at 80° C, the etch rates along the c-axis were 330 and 30 …
[PDF][PDF] High-fidelity patterning of AlN and ScAlN thin films with wet chemicaletching
K Airola, S Mertin, J Likonen, E Hartikainen… - …, 2022 - researchportal.helsinki.fi
abstract We report on the anisotropic wet etching of sputtered AlN and Sc0. 2Al0. 8N thin
films. With tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were …
films. With tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were …
High-fidelity patterning of AlN and ScAlN thin films with wet chemical etching
K Airola, S Mertin, J Likonen, E Hartikainen, K Mizohata… - Materialia, 2022 - cris.vtt.fi
We report on the anisotropic wet etching of sputtered AlN and Sc 0.2 Al 0.8 N thin films. With
tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were 330 and 30 …
tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were 330 and 30 …
[PDF][PDF] High-fidelity patterning of AlN and ScAlN thin films with wet chemicaletching
K Airola - helda.helsinki.fi
abstract We report on the anisotropic wet etching of sputtered AlN and Sc0. 2Al0. 8N thin
films. With tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were …
films. With tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were …
[PDF][PDF] High-fidelity patterning of AlN and ScAlN thin films with wet chemicaletching
K Airola - helda.helsinki.fi
abstract We report on the anisotropic wet etching of sputtered AlN and Sc0. 2Al0. 8N thin
films. With tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were …
films. With tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were …
[PDF][PDF] High-fidelity patterning of AlN and ScAlN thin films with wet chemical etching
K Airola, S Mertin, J Likonen, E Hartikainen, K Mizohata… - cris.vtt.fi
abstract We report on the anisotropic wet etching of sputtered AlN and Sc0. 2Al0. 8N thin
films. With tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were …
films. With tetramethyl ammonium hydroxide at 80 C, the etch rates along the c-axis were …