Pressure-dependent growth of wafer-scale few-layer h-BN by metal–organic chemical vapor deposition

DY Kim, N Han, H Jeong, J Kim, S Hwang… - Crystal Growth & …, 2017 - ACS Publications
A few-layer hexagonal boron nitride (h-BN) films with wafer-scale thickness uniformity were
grown by using a multiwafer metal–organic chemical vapor deposition (MOCVD) system at …
被引用次数：28 相关文章

[引用][C] Pressure-Dependent Growth of Wafer-Scale Few-layer h-BN by Metal–Organic Chemical Vapor Deposition

DY Kim, N Han, H Jeong, J Kim, S Hwang… - Crystal Growth & …, 2017 - cir.nii.ac.jp
Pressure-Dependent Growth of Wafer-Scale Few-layer h-BN by Metal–Organic Chemical
Vapor Deposition | CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細へ …