A combined plasma‐surface model for the deposition of C: H films from a methane plasma
A Von Keudell, W Möller - Journal of applied physics, 1994 - pubs.aip.org
The deposition of C: H layers by an electron‐cyclotron‐resonance plasma from methane
was investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate
temperature between room temperature and 700 K. The film composition, morphology, and
structure were investigated by high‐energy ion beam analysis and scanning electron
microscopy. A combined plasma‐surface model for thin‐film deposition is proposed, which
includes the electron‐induced dissociation of methane in the plasma and a growth model …
was investigated. C: H was deposited at a methane pressure of 1.6 Pa and a substrate
temperature between room temperature and 700 K. The film composition, morphology, and
structure were investigated by high‐energy ion beam analysis and scanning electron
microscopy. A combined plasma‐surface model for thin‐film deposition is proposed, which
includes the electron‐induced dissociation of methane in the plasma and a growth model …
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