Organometallic precursors for atomic layer deposition

M Putkonen, L Niinistö - Precursor Chemistry of Advanced Materials, 2005 - Springer
… practice of atomic layer deposition (ALD) for thin-film growth … Various types of metal-containing
precursors including … alkyls and cyclopentadienyl compounds seem most suitable for ALD

[PDF][PDF] Atomic layer deposition of high-k dielectrics from novel cyclopentadienyl-type precursors

J Niinistö - 2006 - aaltodoc.aalto.fi
… were processed by ALD using novel cyclopentadienyl (Cp, -… ALD, which has been identified
as an important thin film growth … and cyclopentadienyl compounds, can be exploited in ALD

Basic chemistry of CVD and ALD precursors

MA Malik, P O'brien - Chemical Vapour Deposition, 2008 - books.google.com
metal containing precursors that have been used in ALD are … , 345382 using Sr and Ba
cyclopentadienyl compounds as … achieved in the ALD STO films and the films were crystalline …

Synthesis Of Volatile And Thermally Stable Aluminum Hydride Complexes And Their Use In Atomic Layer Deposition Of Metal Thin Films

KJ Blakeney - 2018 - search.proquest.com
ALD of electropositive metal and metal-containing films was evaluated. A major discovery
has been the deposition of aluminum metal films by thermal ALD using … purely thermal ALD to …

New precursors for the deposition of Hf02 and ZrO2 by MOCVD and ALD

R O'Kane - 2007 - livrepository.liverpool.ac.uk
… transportation of a volatile metal-containing precursor in the … be demonstrated that some
compounds can be employed to … and Hf alkoxide and cyclopentadienyl complexes which give …

Processing of Y2O3 Thin Films by Atomic Layer Deposition from Cyclopentadienyl-Type Compounds and Water as Precursors

J Niinistö, M Putkonen, L Niinistö - Chemistry of materials, 2004 - ACS Publications
cyclopentadienyl-type compounds, viz. Cp 3 Sc 27 and Cp 2 Zr(CH 3 ) 2 , 28 have been
used as metal-containing … Sc 2 O 3 and ZrO 2 thin films by ALD, respectively. In these studies, …

Recent advances using guanidinate ligands for chemical vapour deposition (CVD) and atomic layer deposition (ALD) applications

A Kurek, PG Gordon, S Karle, A Devi… - Australian Journal of …, 2014 - CSIRO Publishing
ALD precursors, as well as the deposition of rare-earth-metal-containing thin films via CVD
and ALD … Recent studies of guanidinate compounds and their applications in CVD and ALD

Ab initio calculations of group 4 metallocene reaction mechanisms: atomic layer deposition and bond activation catalysis

A Zydor - 2013 - cora.ucc.ie
Cyclopentadienyl precursors are especially popular in ALD of the … A mixed alkoxide-cyclopentadienyl
titanium compound has … the combination of metal-containing precursor ML4 and an …

Development of Volatile Inorganic Compounds and Their Application for Chemical Vapour Deposition of Metal and Metal Oxide Thin Films

A Kurek - 2015 - repository.library.carleton.ca
… for CVD and ALD precursors and a variety of metal-containing guanidinate compounds with
… Amidinates and guanidinates have been widely used as alternatives to cyclopentadienyl

[HTML][HTML] ALD/ALE 2022 Session AF-MoP: ALD Fundamentals Poster Session

D Zanders - avsconferences.org
… containing ternary compound (Cr-Ti-O) thin films were grown … , heteroleptic precursors
including cyclopentadienyl (Cp) … gas phase transport of metal containing molecules into a reaction …