An experimental study of high pressure synthesis of diamond films using a microwave cavity plasma reactor
KP Kuo, J Asmussen - Diamond and Related Materials, 1997 - Elsevier
Diamond film deposition on Si “benchmark” substrates is experimentally investigated at high
pressures using a microwave plasma disk reactor and CH4/H2 gas mixtures. In this
microwave plasma reactor the plasma is formed inside a 12.7 cm diameter disk-like
discharge region located at one end of an internally tuned cylindrical cavity applicator. A
water cooling stage is employed to control substrate temperature. The input variables of the
experimental evaluation are (1) methane concentration, expressed as c=% CH 4H 2 from …
pressures using a microwave plasma disk reactor and CH4/H2 gas mixtures. In this
microwave plasma reactor the plasma is formed inside a 12.7 cm diameter disk-like
discharge region located at one end of an internally tuned cylindrical cavity applicator. A
water cooling stage is employed to control substrate temperature. The input variables of the
experimental evaluation are (1) methane concentration, expressed as c=% CH 4H 2 from …
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