The nano crystalline Nickel—Phosphorous (NiP) thin films were electroplated on the copper surface at constant current density of 1 A dm− 2 with two different bath temperatures such as 35 C and 70 C. The micro structural and chemical element analysis of NiP thin films have been analysed by SEM (Scanning Electron Microscope), EDX (Energy-dispersive x-ray spectroscopy) and XRD (x-ray Diffraction) pattern. The electrochemical and magnetic behaviours of NiP thin films have been investigated using polarization and impedance analysis and VSM (Vibrating Sample Magnetometer). The SEM micrograph reveals that the coated NiP thin films are bright, uniform and crack free. The XRD pattern shows the existence of Tetragonal and Hexagonal crystalline structures in NiP thin films with crystalline size are in the range of few tens of nanometre. NiP thin films synthesised at 35 C and 70 C have average roughness value of 0.295 and 0.455 μm respectively. The NiP thin films coated at lower bath temperature exhibit the better inhibition efficiency of 91.298% with polarization resistance of 5.486 KΩ compared with higher bath temperature films. The NiP thin film coated at 70 C exhibit the excellent soft magnetic property with lower coercivity of 93.7 G and higher saturation magnetization of 15.556× 10− 3 emu (retentivity of 216.62× 10− 6 emu).