We experimentally re-evaluate the fine structure of ions. These ions are essential in bright extreme-ultraviolet (EUV) plasma-light sources for next-generation nanolithography, but their complex electronic structure is an open challenge for both theory and experiment. We combine optical spectroscopy of magnetic dipole transitions, in a wavelength range covering 260 to 780 nm, with charge-state selective ionization in an electron beam ion trap. Our measurements confirm the predictive power of ab initio calculations based on Fock space coupled cluster theory. We validate our line identification using semiempirical cowan calculations with adjustable wave-function parameters. Available Ritz combinations further strengthen our analysis. Comparison with previous work suggests that line identifications in the EUV need to be revisited.