spatially resolved dopant profiling measurements. It consists of an atomic force microscope
combined with a vector network analyzer operating between 1–20 GHz. On silicon
semiconductor calibration samples with doping concentrations ranging from 10 15 to 10 20
atoms/cm 3, calibrated capacitance-voltage curves as well as derivative dC/dV curves were
acquired. The change of the capacitance and the dC/dV signal is directly related to the …