… It was found that in the absence of an oxidizer, the tungsten surface was passivated most …
in tungsten dissolution. Introduction The chemical mechanical polishing (CMP) of tungsten is …

… last decade, chemical mechanical planarization (CMP) has become firmly established as the
method for … Current microelectronics designs are heavily dependent on tungsten as a stable …

… The chemical composition of abrasive slurry plays an important role in chemical mechanical
polishing (CMP) process. Removal of tungsten is driven by complex oxidation mechanisms …

… roughness on tungsten or W thin films based on the CMP process conditions. The W thin
films with thickness below 1000 nm on silicon wafer were chemical–mechanical polished at …

… Chemical mechanical polishing (CMP) is a powerful fabrication technique that uses chemical
oxidation and mechanical … oxide by abrasion in tungsten chemical mechanical polishing. …

… only been realized through global planarization or polishing techniques. This approach is
also … Chemical mechanical planarization (CMP) has become an enabling technology in these …

… ingredient to the desired location during chemical mechanical polishing (CMP), which …
tungsten-CMP slurry is first presented in which the catalyst is caged inside of a liposome structure…

… investigation on chemical mechanical polishing of W… tungsten alloy is the composite structure
of the tungsten and matrix phases, which are composed of micron-sized spherical tungsten …

… –gate structure in DRAM and W wiring and plugs. The chemical mechanical planarization
(… W-films, which is extremely a critical process for following lithography and another-type film …

… polishing, researchers have conducted extensive research on tungsten polishing methods
… Fe(NO 3 ) 3 for chemical–mechanical polishing of tungsten and found that the mixed oxidant …