… The effect of alumina particle size during chemical mechanical polishing of tungsten has …
roughness of tungsten was observed for increasing particle size. The tungsten removal rate was …

… of tungsten during chemical mechanical polishing (CMP… Chemical mechanical polishing
(CMP) is the most effective and now the predominant method for the removal of excess tungsten …

… of the polishing result, have not yet been presented. This paper presents a model for tungsten
CMP which quantitatively describes the relationship between CMP process parameters (…

… mechanism for tungsten removal. Atomic force microscopy scans of polished tungsten films
… be an important removal mechanism for tungsten during chemical mechanical polishing. …

… It was found that in the absence of an oxidizer, the tungsten surface was passivated most …
in tungsten dissolution. Introduction The chemical mechanical polishing (CMP) of tungsten is …

… low pressure chemical vapor deposition LPCVD process are the … The processing steps
include deposition of blanket tungsten … tungsten by chemical mechanical polishing CMP process. …

… Due to the complexity of chemical mechanical polishing (CMP) in general and metal CMP in
… the tungsten CMP process. While the chemical Preston model is used to explain the effect of …

… -CMP process to improve the qualities of the polished wafers. … pad to polish most of the bulk
tungsten with a high polish rate. … additive to slowly polish the remaining tungsten. In this way, …

… In this study, we estimate the probable contributions of abrasion in CMP of tungsten metal,
which is one of the metals used in integrated circuits. The low-pH slurry contains nano-scale …

… tungsten features if a process chemistry appropriate for wafer fabrication were available.
Chemicalmechanical polishing … The mechanism we propose for the process (Fig. 2) requires the …