over 260K is reported. The laser design followed an “anticrossed-diagonal” scheme of Page
et al.[1]. The QCL GaAs/Al 0.45 Ga 0.55 As heterostructures were grown by solid source
(SS) MBE. The double trench lasers were fabricated using wet etching and Si 3 N 4 for
electrical insulation. Double plasmon confinement with Al-free waveguide has been used to
minimize absorption losses. Optical and electrical properties of resulting devices are …