With the rapid advances in nanoscience, there is a need to develop simple and rapid
fabrication techniques to create highly ordered functional nanostructures.[1–3] Block
copolymers are of significant interest in this area because of their ability to self assemble into
a variety of interesting and useful morphologies for application in nanolithography and
assembly of nanodevices.[4–7] Obtaining long-range order in block copolymers has
received much attention.[8–11] In particular, chemically modified surfaces have been used …

… Nano-patterned polymer structures by directed assembly of polymer blends using chemically
heterogeneous patterns in thin films have many applications in biosensors, integrate circuits,
and thin-film optoelectronic devices. Polystyrene (PS)/poly(acrylic acid) (PAA) blends were
patterned into both uniform and non-uniform geometries by directed assembly of polymer blends
using chemically heterogeneous patterns. Spin-coating speed and solution concentration
were used to control the characteristic length of … In addition, the dewetting behaviors of …