Dry etching of AlTiC with CF/sub 4/and H/sub 2/for slider fabrication
M Zhang, YS Hor, G Han, B Liu - IEEE transactions on …, 2003 - ieeexplore.ieee.org
… the etching selectivity between photoresist and Al O [7]. In this paper, the etching process of
AlTiC by inductively coupled plasma (… Compared with early reactive ion etching system, ICP …
AlTiC by inductively coupled plasma (… Compared with early reactive ion etching system, ICP …
Atomic-scale etching mechanism of aluminum with fluorine-based plasma
A Asaduzzaman - The Journal of Physical Chemistry C, 2022 - ACS Publications
… The polishing and functionalizing of fabricated microelectronic devices have been carried
… to clean the etch product, was also explored. Molecular plasma gases like CF 4 and CHF 3 …
… to clean the etch product, was also explored. Molecular plasma gases like CF 4 and CHF 3 …