using epitaxially grown Fe 3 Si/Si Schottky-tunnel-barrier contacts. By an insertion of a δ-
doped n+-Si layer (∼ 10 19 cm− 3) near the interface between a ferromagnetic Fe 3 Si
contact and a Si channel (∼ 10 15 cm− 3), we achieve a marked enhancement in the
tunnel conductance for reverse-bias characteristics of the Fe 3 Si/Si Schottky diodes. Using
laterally fabricated four-probe geometries with the modified Fe 3 Si/Si contacts, we detect …