We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe
cantilevers, including on the irregular surface of protruding cantilever tips. The process
includes a floating-layer technique to coat the cantilevers in an electron-beam resist. We
demonstrate gate definition through a lift-off process and through an etching process. The
cantilevers maintain a high force sensitivity after undergoing the patterning process. Our
method allows the patterning of nanoscale devices on fragile scanning probes, extending …