using atomic-layer deposition (ALD) sidewall passivation were demonstrated. Due to the
high surface recombination velocity and minority carrier diffusion length of the AlGaInP
material system, devices without sidewall passivation suffered from high leakage and severe
drop in external quantum efficiency (EQE). By employing ALD sidewall treatments, the 20×
20 µm^ 2 µLEDs resulted in greater light output power, size-independent leakage current …