In situ monitoring of electrical resistance of nanoferrite thin film irradiated by 190 MeV Au14+ ions
A highly resistive nanocrystalline thin film of Li0. 25Mg0. 5Mn0. 1Fe2. 15O4, deposited by
RF magnetron sputtering technique on Si (100) substrate, is irradiated with 190 MeV Au14+
ions. To probe the swift heavy ion induced modifications in the electrical properties in the
film an in situ measurement of electrical resistance using two-probe method is carried out.
We observe the value of resistivity comes down drastically from 1.5× 108 to 1× 105 Ωcm
after irradiation at the fluence of 1× 1013 ions/cm2. In XRD spectra after irradiation no …
RF magnetron sputtering technique on Si (100) substrate, is irradiated with 190 MeV Au14+
ions. To probe the swift heavy ion induced modifications in the electrical properties in the
film an in situ measurement of electrical resistance using two-probe method is carried out.
We observe the value of resistivity comes down drastically from 1.5× 108 to 1× 105 Ωcm
after irradiation at the fluence of 1× 1013 ions/cm2. In XRD spectra after irradiation no …
以上显示的是最相近的搜索结果。 查看全部搜索结果