in a H 2/CH 4 Micro-Wave (MW frequency f= 2.45 GHz) plasma reactor dedicated to
diamond deposition under high pressure and high power conditions. Parametric studies
such as a function of MW power, pressure, and admixtures of methane have been carried
out on a wide range of experimental conditions: the pressure up to 270 mbar and the MW
power up to 4 kW. These conditions allow high purity Chemical Vapor Deposition diamond …