Modeling of metastable phase formation diagrams for sputtered thin films

K Chang, D Music, M to Baben, D Lange… - … and Technology of …, 2016 - Taylor & Francis
K Chang, D Music, M to Baben, D Lange, H Bolvardi, JM Schneider
Science and Technology of advanced MaTerialS, 2016Taylor & Francis
A method to model the metastable phase formation in the Cu–W system based on the critical
surface diffusion distance has been developed. The driver for the formation of a second
phase is the critical diffusion distance which is dependent on the solubility of W in Cu and on
the solubility of Cu in W. Based on comparative theoretical and experimental data, we can
describe the relationship between the solubilities and the critical diffusion distances in order
to model the metastable phase formation. Metastable phase formation diagrams for Cu–W …
Abstract
A method to model the metastable phase formation in the Cu–W system based on the critical surface diffusion distance has been developed. The driver for the formation of a second phase is the critical diffusion distance which is dependent on the solubility of W in Cu and on the solubility of Cu in W. Based on comparative theoretical and experimental data, we can describe the relationship between the solubilities and the critical diffusion distances in order to model the metastable phase formation. Metastable phase formation diagrams for Cu–W and Cu–V thin films are predicted and validated by combinatorial magnetron sputtering experiments. The correlative experimental and theoretical research strategy adopted here enables us to efficiently describe the relationship between the solubilities and the critical diffusion distances in order to model the metastable phase formation during magnetron sputtering.
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