[HTML][HTML] Multi-layering of SU-8 exhibits distinct geometrical transitions from circular to planarized profiles
The negative tone photoresist SU-8 permits the creation of micrometer-scale structures by
optical lithography. It is also the most used photoresist in soft lithography for the fast-
prototyping of microfluidic devices. Despite its importance, the effect of capillary forces on
SU-8 multi-layering onto topographical features has not been thoroughly studied. In
particular, the profile of the added layer has not been examined in detail. The overlaying
process exhibits a set of distinct behaviors, or regimes, depending on the relative thickness …
optical lithography. It is also the most used photoresist in soft lithography for the fast-
prototyping of microfluidic devices. Despite its importance, the effect of capillary forces on
SU-8 multi-layering onto topographical features has not been thoroughly studied. In
particular, the profile of the added layer has not been examined in detail. The overlaying
process exhibits a set of distinct behaviors, or regimes, depending on the relative thickness …
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