We describe a technique for fabricating micro-and nanostructures incorporating fluorescent
defects in diamond with a positional accuracy better than hundreds of nanometers. Using
confocal fluorescence microscopy and focused ion beam etching, we initially locate a
suitable defect with respect to registration marks on the diamond surface then etch a
structure using these coordinates. We demonstrate the technique by etching an 8 μ m
diameter hemisphere positioned with single negatively charged nitrogen-vacancy defect lies …