Optical properties of zinc doped NiO thin films deposited by RF magnetron sputtering
I Manouchehri, SAO AlShiaa, D Mehrparparvar… - Optik, 2016 - Elsevier
Optik, 2016•Elsevier
Undoped and zinc doped NiO thin films were deposited by RF magnetron sputtering on
glass substrates, 0–8% Zn@ NiOinfivesteps.(*) The plasma was a mixture of oxygen and
argon with fixed ratio during the sputtering process. Film thickness was measured by means
of ellipsometry apparatus. Investigation of these films has been done using X-ray diffraction,
Atomic force microscopy, FE-SEM, EDS and UV–vis spectroscopy. X-ray diffraction analysis
suggest that cubic NiO structure formed which its crystallinity drastically affected by zinc …
glass substrates, 0–8% Zn@ NiOinfivesteps.(*) The plasma was a mixture of oxygen and
argon with fixed ratio during the sputtering process. Film thickness was measured by means
of ellipsometry apparatus. Investigation of these films has been done using X-ray diffraction,
Atomic force microscopy, FE-SEM, EDS and UV–vis spectroscopy. X-ray diffraction analysis
suggest that cubic NiO structure formed which its crystallinity drastically affected by zinc …
Abstract
Undoped and zinc doped NiO thin films were deposited by RF magnetron sputtering on glass substrates, 0–8% Zn@NiOinfivesteps.(*) The plasma was a mixture of oxygen and argon with fixed ratio during the sputtering process. Film thickness was measured by means of ellipsometry apparatus. Investigation of these films has been done using X-ray diffraction, Atomic force microscopy, FE-SEM, EDS and UV–vis spectroscopy. X-ray diffraction analysis suggest that cubic NiO structure formed which its crystallinity drastically affected by zinc dopant percentage. Interesting results have been obtained from the study of optical spectra, it is seen that with increasing zinc dopant percentage band gap energy decreases monotonically. However transmittance decreases from 90 to 30% for the undoped and zinc doped NiO thin films.
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