[引用][C] Organic solvent-free water-developable sugar resist material derived from biomass in eco-friendly green lithography
伊都将司 - Microelectronic Engineering - cir.nii.ac.jp
Organic solvent-free water-developable sugar resist material derived from biomass in eco-friendly
green lithography | CiNii Research … Organic solvent-free water-developable sugar resist
material derived from biomass in eco-friendly green lithography … タイトル Organic solvent-free
water-developable sugar resist material derived from biomass in eco-friendly green
lithography …
green lithography | CiNii Research … Organic solvent-free water-developable sugar resist
material derived from biomass in eco-friendly green lithography … タイトル Organic solvent-free
water-developable sugar resist material derived from biomass in eco-friendly green
lithography …
Organic solvent-free water-developable sugar resist material derived from biomass in green lithography
S Takei, A Oshima, T Ichikawa, A Sekiguchi… - Microelectronic …, 2014 - Elsevier
We have demonstrated an organic solvent-free water-developable branched sugar resist
material derived from biomass for its use in green electron beam lithography. This
emphasizes the use of plant products instead of conventionally used tetramethylammonium
hydroxide and organic solvents. The rationally designed water-developable branched sugar
resist material developed in this study can be patterned with an excellent sensitivity of 7
μC/cm 2 and a resolution of 50–200 nm lines. In addition, it indicated sufficient thermal …
material derived from biomass for its use in green electron beam lithography. This
emphasizes the use of plant products instead of conventionally used tetramethylammonium
hydroxide and organic solvents. The rationally designed water-developable branched sugar
resist material developed in this study can be patterned with an excellent sensitivity of 7
μC/cm 2 and a resolution of 50–200 nm lines. In addition, it indicated sufficient thermal …
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