Plasma-etching of 2D-poled glasses: A route to dry lithography
SE Alexandrov, AA Lipovskii, AA Osipov… - Applied Physics …, 2017 - pubs.aip.org
The basis of a lithographic technique for producing glassy structures of diffractive optics,
integrated optics, microfluidics, plasmonics, etc., is presented. The technique is based on the
integration of two “dry” procedures:(1) glass polarization with structured (with relief surface)
anodic electrode and (2) plasma-chemical etching of the poled glass. A pilot relief structure
(that is, relief pattern 0.5 μm in depth) on the glass surface has been produced with the
proposed technique.
integrated optics, microfluidics, plasmonics, etc., is presented. The technique is based on the
integration of two “dry” procedures:(1) glass polarization with structured (with relief surface)
anodic electrode and (2) plasma-chemical etching of the poled glass. A pilot relief structure
(that is, relief pattern 0.5 μm in depth) on the glass surface has been produced with the
proposed technique.
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