charge storage at the SiO 2/nanotube interface. We show that this type of memory device is
robust, withstanding over 10 5 operating cycles, with a current drive capability up to 10− 6 A
at 20 mV drain bias, thus competing with state-of-the-art Si-devices. We find that the device
performance depends on temperature and pressure, while both endurance and data
retention are improved in vacuum.