Relative angle determinable stitching interferometry for hard x-ray reflective optics
H Mimura, H Yumoto, S Matsuyama… - Review of Scientific …, 2005 - pubs.aip.org
Metrology plays an important role in surface figuring with subnanometer accuracy. We have
developed relative angle determinable stitching interferometry for the surface figuring of
elliptical mirrors, in order to realize hard x-ray nanofocusing. In a stitching system, stitching
angles are determined not by the general method using a common area between
neighboring shots, but by the new method using the mirror's tilt angles measured at times
when profile data are acquired. The high measurement accuracy of approximately 4 nm …
developed relative angle determinable stitching interferometry for the surface figuring of
elliptical mirrors, in order to realize hard x-ray nanofocusing. In a stitching system, stitching
angles are determined not by the general method using a common area between
neighboring shots, but by the new method using the mirror's tilt angles measured at times
when profile data are acquired. The high measurement accuracy of approximately 4 nm …
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