Removal of amorphous carbon and tin films from a Mo: Si multilayer mirror surface in a
hydrogen plasma and its afterglow is investigated. In the afterglow, the mechanism of Sn
and C films removal is solely driven by hydrogen atoms (radicals). Probabilities of Sn and C
atoms removal by H atoms were measured. It was shown that the radical mechanism is also
dominant for Sn atoms removal in the hydrogen plasma because of the low ion energy and
flux. Unlike for Sn, the removal mechanism for C atoms in the plasma is ion-stimulated and …