… to measure and control them in real time. Although research on the control of plasma etching
processes has been actively carried out, the plasma etching process strongly relies on the …

… on the design of MPC for a plasma etch process on a 3D substrate using inductive coupled
plasma (ICP) analysis. Specifically, the plasma etch process is simulated by a multiscale …

… We propose robust neurocontrollers for this problem and … to consider highly nonlinear control
systems where many … as four neurocontrollers to control the plasma etching process. For …

… used in system identification and shows great performance in coping with nonlinear system.
… But we consider to include the application of the robust control and optimization to analyze …

This paper presents the methodology developed for the automatic feedback control of a silicon
nitride plasma etch process. The methodology provides an augmented level of control for …

… control, neurocontrol, robust and hierarchical control based on both linear and nonlinear
models of the Plasma … overall intelligent control structures of the plasma etching processes to …

… control system on a parallel electrode plasma etching (PE) process with showerhead
arrangement used to etch a 500 … The feedback control system consists of three spatially distributed …

… etch rate characterization is obtained by monitoring the etch dependence on varying tool
state parameters. The density of the etch … An etch rate model, based on the input power to the …

… to improve the plasma etching quality indicators of … a robust controller that takes into
consideration all these disturbances and uncertainties about the process, as well as the nonlinearity …

… to apply in the control and optimisation system under the model … due to their excellent
non-linear dynamic system recognition ability. … However, due to the non-linear nature and strong …