Novel and cost-effective multiple patterning technology by means of invisible SiOxNy hardmask

L Jang, YJ Moon, RH Kim, C Bencher… - … in Patterning …, 2014 - spiedigitallibrary.org
… compatible with the invisible SiO x N y hardmask. Lithographic process windows, CDU,
and … triple patterning memorized into the SiO x N y hardmask after which patterns are then …

Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing

T Ghoshal, MT Shaw, JD Holmes, MA Morris - Nano Research, 2016 - Springer
… Here, we show that ultra-small-dimension hard masks can be used to develop large … patterns
were solvent-processed, and metal ions were included into chosen domains via a selective

Inorganic hardmask development for extreme ultraviolet patterning

A De Silva, A Dutta, L Meli, Y Yao… - Journal of Micro …, 2019 - spiedigitallibrary.org
… inorganic hardmasks and how they can be used in EUV patterning stacks. The hardmask
resist scumming while the bulk etch selectivity is targeted to tune hardmask open selectivity. …

Nanofabrication on unconventional substrates using transferred hard masks

L Li, I Bayn, M Lu, CY Nam, T Schröder, A Stein… - Scientific reports, 2015 - nature.com
hard masks for reactive-ion etching. Here, we demonstrate the applicability of our method to
pattern sub-… exceptionally high spatial patterning resolution with excellent etching selectivity. …

Fabrication of graphoepitaxial gate-all-around Si circuitry patterned nanowire arrays using block copolymer assisted hard mask approach

T Ghoshal, R Senthamaraikannan, MT Shaw… - ACS …, 2021 - ACS Publications
… block selectivity and directionality of the etching protocol and reproducibility. Hard masks are
… Different hard masks such as dielectrics (SiO 2 , Al 2 O 3 , and Si 3 N 4 ), metal oxides, and …

Patterning of narrow porous SiOCH trenches using a TiN hard mask

M Darnon, T Chevolleau, D Eon, R Bouyssou… - Microelectronic …, 2008 - Elsevier
patterning is performed by etching trenches and vias in porous … Metallic hard masks can help
thanks to their high selectivity … key issues related to the patterning of narrow porous SiOCH …

Dry etch selectivity of aC: H hardmasks for sub-65nm patterning applications

D Padhi, BH Kim, D Witty - Journal of Vacuum Science & Technology B …, 2009 - pubs.aip.org
… a good hardmask include the ability to transfer patterns into … goal, the hardmask film must
possess superior etch selectivity … show that etch selectivity of a - C : H hardmask (to underlayers…

Study of alternate hardmasks for extreme ultraviolet patterning

A De Silva, I Seshadri, A Arceo, K Petrillo… - Journal of Vacuum …, 2016 - pubs.aip.org
patterning on deposited hardmasks of various types such as silicon oxides and metal hardmasks.
It … if the etch selectivity between resist/hardmask and hardmask/OPL layer is increased. …

Focused ion beam direct patterning of hardmask layers

S Waid, HD Wanzenboeck, M Muehlberger… - Journal of Vacuum …, 2014 - pubs.aip.org
… provided by the inorganic hardmasks comes at the expense of … the method of direct patterning
of hard masks (DPHM) utilizing … an etch selectivity of 22 for the deposited Pt hardmask as …

Parallel arrays of sub-10 nm aligned germanium nanofins from an in situ metal oxide hardmask using directed self-assembly of block copolymers

C Cummins, A Gangnaik, RA Kelly, AJ Hydes… - Chemistry of …, 2015 - ACS Publications
… precursors as hardmask materials to pattern high-… hardmasks for pattern transfer with
each exhibiting similar efficacy. Highly selective dry etch procedures were employed to pattern