Spectroscopic ellipsometry characterization of SiNx antireflection films on textured multicrystalline and monocrystalline silicon solar cells
MF Saenger, J Sun, M Schädel, J Hilfiker, M Schubert… - Thin Solid Films, 2010 - Elsevier
We present a spectroscopic ellipsometry study of silicon nitride based antireflection films
deposited on chemically textured multi-and monocrystalline silicon wafers. The ellipsometric
parameters were measured from the near infrared to the ultra violet spectral region. We
report the effective thickness and complex index of refraction parameters of the antireflection
films from all studied surfaces, regardless of their microscopic morphology. We report on a
method to make ellipsometric measurements of the effective optical constants and thickness …
deposited on chemically textured multi-and monocrystalline silicon wafers. The ellipsometric
parameters were measured from the near infrared to the ultra violet spectral region. We
report the effective thickness and complex index of refraction parameters of the antireflection
films from all studied surfaces, regardless of their microscopic morphology. We report on a
method to make ellipsometric measurements of the effective optical constants and thickness …
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