[HTML][HTML] Synthesis of model Al-Al2O3 multilayer systems with monolayer oxide thickness control by circumventing native oxidation
A hybrid thin film deposition system was built by combining physical vapor deposition (PVD)
with atomic layer deposition (ALD) without breaking high vacuum, which was achieved by a
chamber-in-chamber design. The vacuum is better than 1× 10− 5 Pa during the entire
sample transfer process between the ALD and PVD chambers. The Al-Al 2 O 3 multilayers
synthesized by the PVD-ALD integrated system consist of ALD Al 2 O 3 sublayers between
pure PVD Al sublayers. The Al 2 O 3 sublayers, with incremental thickness of 1 nm from 1 to …
with atomic layer deposition (ALD) without breaking high vacuum, which was achieved by a
chamber-in-chamber design. The vacuum is better than 1× 10− 5 Pa during the entire
sample transfer process between the ALD and PVD chambers. The Al-Al 2 O 3 multilayers
synthesized by the PVD-ALD integrated system consist of ALD Al 2 O 3 sublayers between
pure PVD Al sublayers. The Al 2 O 3 sublayers, with incremental thickness of 1 nm from 1 to …
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