High performance molybdenum-doped indium oxide (IMO) films were deposited on slide glass substrates from metallic targets by using dc reactive magnetron sputtering at room temperature. The structural, electrical and optical properties have been investigated as functions of target composition and oxygen partial pressure. The deposited films were smooth and amorphous, as determined by scanning electron microscopy and x-ray diffraction, respectively. The results revealed that the as-deposited molybdenum-doped In 2 O 3 films show good electrical property and high optical transmittance, as well as high infrared transmittance. The films prepared at oxygen partial pressure of 3.8× 10− 2 Pa and with 2 wt% Mo-doped target are characteristic of high Hall mobility of 20.2 cm 2 V− 1 s− 1, carrier concentration of 5.2× 10 20 cm− 3, and the average optical transmittance excess 90% in the visible region from 400 to 700 nm. Thus IMO films may be a potential material for novel optoelectrical devices such as an organic light-emitting diode.