Extreme ultraviolet (EUV) light generated by tin-plasma is used for state-of-the-art nanolithography. Currently, the plasma is generated by irradiating tin-microdroplets with 10-micometer wavelength light from CO2-gas lasers. Energy efficient solid-state lasers providing 2-micron wavelength main-pulses may present a viable option for driving EUV-emitting plasma. The 2-micron drive wavelength is situated between the well-studied cases of 1- and 10-micron. Our experiments, using pre-pulse deformed tin droplet targets, show that a 2-micron main-pulse has the potential to provide a higher-brightness source, compared to the 10-micron laser case, with a higher conversion efficiency than in the 1-micron laser case.