Wafer-scale detachable monocrystalline germanium nanomembranes for the growth of III–V materials and substrate reuse
Germanium (Ge) is increasingly used as a substrate for high-performance optoelectronics,
photovoltaics, and electronic devices. These devices are usually grown on thick and rigid Ge
substrates manufactured by classical wafering techniques. Nanomembranes (NMs) provide
an alternative to this approach while offering wafer-scale lateral dimensions, weight
reduction, waste limitation, and cost effectiveness. Herein, we introduce the Porous
germanium Efficient Epitaxial LayEr Release (PEELER) process, which consists of the …
photovoltaics, and electronic devices. These devices are usually grown on thick and rigid Ge
substrates manufactured by classical wafering techniques. Nanomembranes (NMs) provide
an alternative to this approach while offering wafer-scale lateral dimensions, weight
reduction, waste limitation, and cost effectiveness. Herein, we introduce the Porous
germanium Efficient Epitaxial LayEr Release (PEELER) process, which consists of the …
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