Graphene devices on standard SiO 2 substrates are highly disordered, exhibiting characteristics that are far inferior to the expected intrinsic properties of graphene 1, 2, 3, 4 …
A buried metal-gate field-effect transistor (FET) using a stacked hexagonal boron nitride (h- BN) and chemically vapor deposited (CVD) graphene heterostructure is demonstrated. A …
S Fukamachi, P Solís-Fernández, K Kawahara… - Nature …, 2023 - nature.com
Multilayer hexagonal boron nitride (hBN) can be used to preserve the intrinsic physical properties of other two-dimensional materials in device structures. However, integrating the …
We investigate band gap tuning of bilayer graphene between hexagonal boron nitride sheets, by external electric fields. Using density functional theory, we show that the gap is …
M Wang, SK Jang, WJ Jang, M Kim, SY Park… - Advanced …, 2013 - Wiley Online Library
After graphene emerged as a material with the potential to supplant silicon in future electronic devices because of its superior electronic properties, there has been a flurry of …
Hexagonal boron nitride (h-BN) is a promising dielectric material for graphene-based electronic devices. Here we investigate the potential of h-BN gate dielectrics, grown by …
Z Liu, L Song, S Zhao, J Huang, L Ma, J Zhang… - Nano …, 2011 - ACS Publications
Graphene (G) and atomic layers of hexagonal boron nitride (h-BN) are complementary two- dimensional materials, structurally very similar but with vastly different electronic properties …
When combined with graphene, hexagonal boron nitride (h-BN) is an ideal substrate and gate dielectric with which to build metal| h-BN| graphene field-effect devices. We use first …
Graphene–boron nitride monolayer heterostructures contain adjacent electrically active and insulating regions in a continuous, single-atom thick layer. To date structures were grown at …